Cover Image
市场调查报告书

光罩生产、瑕疵检查及修复市场分析及课题

Mask Making, Inspection, and Repair: Market Analysis and Strategic Issues

出版商 Information Network 商品编码 4962
出版日期 内容信息 英文
商品交期: 最快1-2个工作天内
价格
Back to Top
光罩生产、瑕疵检查及修复市场分析及课题 Mask Making, Inspection, and Repair: Market Analysis and Strategic Issues
出版日期: 2018年09月01日 内容信息: 英文
简介

本报告为,汇整光罩生产、瑕疵检查及修复设备之技术课题、供应商策略及机会、市场预测等,以下列摘要形式阐述。

第1章 简介

第2章 实施概要

  • 主要课题概要
  • 市场机会概要

第3章 技术课题

  • 光罩生产
    • 光罩基板
    • 光罩成品
  • 光罩生产设备
    • 电子束系统
    • 激光图形产生工具
  • 光罩检查
    • 光罩瑕疵
  • 光罩修复
    • 激光修复
    • 聚焦离子束修复
    • 其他修复方式

第4章 用户ー供应商策略

  • 确立用户需求
    • 光罩生产
    • 微米光罩制作
    • 光罩检查设备
    • 光罩修复激光 vs. FIB
    • PSM(相位移光)
    • OPC(光学邻近修正)
    • NGL技术课题
  • 竞合供应商之商业机会

第5章 市场预测

  • 影响市场因素
    • 概要
    • IC电路加工技术趋势
    • 光罩及倍缩光罩需求之相关要件
    • 快速周转设备
    • e光束及X光直接写入之影响
  • 市场预测及先决条件
  • 光罩生产、检查及修复
  • 光罩成品市场
    • 倍缩光罩/光罩设备

图表

本网页内容可能与最新版本有所差异。详细情况请与我们联系。

目录

Each new generation of IC devices brings about a corresponding decrease in linewidths and minimum feature sizes. The technological trends and innovations in IC fabrication processes directly influence the market for masks and mask making equipment. This report examines and projects the technologies involved, their likely developments, why and when their introduction or demise will take place, what problems and choices are facing users, and where the opportunities and pitfalls are.

This report addresses the strategic issues impacting the mask making, inspection, and repair sectors of the semiconductor industry in the U.S. and the world. The mask market is segmented by geographic region. The mask equipment markets are analyzed and projected and market shares presented.

Table of Contents

Chapter 1 Introduction

  • 1.1 The Need For This Report

Chapter 2 Executive Summary

  • 2.1 Summary of Major Issues
  • 2.2 Summary of Market Opportunities

Chapter 3 Technology Issues

  • 3.1 Mask Making
    • 3.1.1 Mask Blanks
    • 3.1.2 Completed Masks
  • 3.2 Mask Making Equipment
    • 3.2.1 Electron Beam Systems
    • 3.2.2 Laser Pattern Generators
  • 3.3 Mask Inspection
    • 3.3.1 Mask Defects
      • Transmission Variations
      • Transparent Defects
      • Nuisance Defects
      • CD Variations
      • Reflectivity Variations
  • 3.4 Mask Repair
    • 3.4.1 Laser Repair
    • 3.4.2 Focused Ion Beam Repair
    • 3.4.3 Other Repair Methods

Chapter 4 User - Vendor Strategies

  • 4.1 Establishing User Needs
    • 4.1.1 Mask Making - Merchant or Captive
    • 4.1.2 Submicron Mask Making Equipment - Laser vs E-Beam
    • 4.1.3 Mask Inspection Equipment
    • 4.1.4 Mask Repair - Laser vs FIB
    • 4.1.5 Phase-Shift Masks
    • 4.1.6 Optical Proximity Correction
    • 4.1.7 NGL Technology Challenges
      • 4.1.7.1 X-Ray Masks
      • 4.1.7.2 EPL Masks
      • 4.1.7.3 EUVL Masks
  • 4.2 Competitive Vendor Opportunities

Chapter 5 Market Forecast

  • 5.1 Driving Forces
    • 5.1.1 Introduction
    • 5.1.2 Trends in IC Processing Technology
    • 5.1.3 Mask and Reticle Requirements
    • 5.1.4 Fast Turnaround Devices
    • 5.1.5 Impact of Direct Write E-Beam and X-Ray
  • 5.2 Market Forecast Assumptions
  • 5.3 Mask Making, Inspection, and Repair
    • 5.3.1 Completed Mask Market
    • 5.3.2 Reticle/Mask Manufacturing Equipment

List of Figures

  • 3.1 Light Transmittance of Glasses
  • 3.2 Photomask Fabrication Flow
  • 3.3 Optical Photomask Fabrication Flow
  • 3.4 SCAPLEL Photomask Fabrication Flow
  • 3.5 MaskRigger Software in a Mask Fabrication Process
  • 3.6 Schematic of a Laser Pattern Generator
  • 3.7 Mulith Reference Distribution Aerial Image Formation
  • 3.8 Die-to-Die and Die-to-Database Inspection
  • 3.9 Defect Inspection Practices
  • 3.10 Percentage of Yield Losses
  • 3.11 Yield for Masks
  • 3.12 Yield for Binary Masks
  • 3.13 Schematic of a Focused Ion Beam System
  • 3.14 Illustration of Clear and Opaque Mask Repair
  • 4.1 Write Time Versus Device Complexity
  • 4.2 Subwavelength Gap
  • 4.3 Lithography Requiements
  • 4.4 Phase-Shifting Masks
  • 4.5 iN Phase Mask Design
  • 4.6 Illustration of OPC
  • 4.7 Main NGL Mask Formats
  • 4.8 Mask Costs Versus Feature Size
  • 5.1 Increasing Mask Complexity
  • 5.2 Production Costs for Maskmaking
  • 5.3 Capital Expenditures and Revenues
  • 5.4 Photomask Functionality
  • 5.5 Worldwide Merchant Mask Making Market Shares
  • 5.6 North American Merchant Mask Making Market Shares
  • 5.7 European Merchant Mask Making Market Shares
  • 5.8 Pacific Rim Merchant Mask Making Market Shares
  • 5.9 Japan Merchant Mask Making Market Shares
  • 5.10 Mask Inspection Market Shares
  • 5.11 Mask Metrology Market Shares
  • 5.12 Mask Repair Market Shares
  • 5-13 Photomask Repair Methods

List of Tables

  • 4.1 FIB and Laser Repair Comparison
  • 4.2 NGL Mask Formats
  • 4.3 Cost of Reticle/X-Ray Mask
  • 4.4 Phase Shift Mask and X-Ray Mask Manufacturing
  • 5.1 Roadmap of Mask Inspection
  • 5.2 IC Lithographic Requirements
  • 5.3 Increasing Mask Complexity
  • 5.4 Worldwide Mask Making Market by Feature Size
  • 5.5 Captive Mask Shops
  • 5.6 Worldwide Mask Making Equipment Market Forecast
  • 5.7 Mask Inspection Market Forecast
  • 5.8 Mask Metrology Market Forecast
Back to Top